Journal of Applied Science and Engineering

Published by Tamkang University Press

1.30

Impact Factor

2.10

CiteScore

Chi-Young Lee  1

1Department of Applied Chemistry National University of Kaohsung, Kaohsung, Taiwan 811, R.O.C.


 

Received: January 21, 2002
Accepted: February 15, 2002
Publication Date: March 1, 2002

Download Citation: ||https://doi.org/10.6180/jase.2002.5.1.04  


ABSTRACT


Halides were used as the precursors to prepare various kinds of materials by stripped off the halogens. Metals, metal silicides and carbon related materials could be prepared by using metal halides, silicon halides and carbon halides as the precursors. Some active metals and active meta stable species were used as stripping reagents.


Keywords: Halides, Reduction, Silicides, Carbon Oinions.


REFERENCES


  1. [1] Lee, C. Y. and Yang, W. C., “The Study of Chemical Vapor Deposition Reaction Between Tungsten Hexafluoride and Silicon Difluoride,” J. Mater. Chem. Vol. 9, pp. 2445-2448 (1999).
  2. [2] Lee, C. Y., Huang, J. L. and Liu, C. S., “CVD of Tantalum Silicide Thin Film from Difluoro Silylene and Tantalum Halides,” J. Mater. Chem. Vol. 6, pp. 1131-1134 (1996).
  3. [3] Lee, C. Y. and Chang, W. T., “Polycrystalline Si1-XGeX Thin Films Formation by Chemical Vapor Deposition Using Silicondifluoride and Germanium Tetarchloride as Precursors,” J. Mater. Chem., Vol. 11, pp. 687-691 (2001).
  4. [4] Lee, C. Y., “The Preparation of Titanium Based Thin Film by Chemical Vapor Deposition Using Titanium Chlorides as the Precursors,” Chem. Vap. Deposition, 5, pp. 69-71 (1999).
  5. [5] Lee, C. Y., Chiu, H.T., Peng, C. W., Yen, M. Y., Chang, Y. H. and Liu, C. S., “Polygon Building Block Route to sp2 Carbon Based Materials,” Advance Materials., Vol. 13, pp. 1105-1106 (2001).